Tsev > Xov xwm > Ntsiab lus

OLED Photoresist Cov Khoom Thiab Kev Npaj Rau Cov Txheej Txheem

Mar 15, 2018

Photoresist yog ib qho khoom ua rau cov khoom ua pauv hloov hauv cov teebmeem ntawm ultraviolet, excimer laser, electron beam, ion beam, X ray thiab lwm yam teeb ci. Cov ntawv tseem ceeb muaj xws li semiconductor integrated circuits, discrete devices, vaj huam sib luag rau sab nrauv, LED, thiab nti chip ntim, hlau nplaum lub taub hau thiab precision sensors.


Thaum pib, photoresist tau siv rau hauv kev lag luam luam, thiab maj mam siv nyob rau hauv thaj tsam ntawm cov ntawv cog lus Circuit Boards hauv xyoo 1920s. Nyob rau hauv xyoo 1950, nws tau pib ua ntawv thov nyob rau hauv kev lag luam semiconductor. Thaum xaus rau xyoo 1950, Eastman Kodak thiab Shipley tau tsim los rau cov kev lag luam nyob rau hauv kev lag luam yuav tsum muaj qhov zoo thiab tsis zoo.


Photoresist siv qhov sib txawv ntawm qhov kev sib tawg ntawm qhov raug thiab thaj chaw tsis pom meej kom ua tiav cov duab hloov. Los ntawm cov txheej txheem tshwj xeeb los piav, vim hais tias photoresist muaj teeb meem tshuaj lom neeg, uas yuav siv tau rau cov kev yees duab ntawm kev yees duab, photoresist coated semiconductor, tus neeg xyuas pib thiab cov insulator, cov kev tiv thaiv tiv thaiv ntawm cov seem hauv qab, ces tus etchant etching yuav tsum tus nplaig txawv daim npog qhov ncauj hloov mus rau txheej txheem ntawm lub qauv. Yog li no, photoresist yog cov tshuaj tseem ceeb hauv cov khoom siv ua zauv hauv micro.


01 photolithography thiab kaum kauj ruam txheej txheem

Kev npaj deg: tu thiab ntub cov wafer qhuav

Txheej: txheej ib zaj duab xis nyias ntawm photoresist nyob rau saum npoo los ntawm kauv txheej

Mos muag: vaporising qhov hnyav ntawm photoresist los ntawm cua sov

Sib txhig thiab kis tau tus kabmob: tus npliag siab ntawm daim npog ntsej muag nrog lub wafer thiab raug thawb lub photoresist.

Kev loj hlob: tshem tawm cov phom sij tsis yog polymerized

Taub ci hnyav: nruam evaporation ntawm qhov hnyav

Kev txheeb xyuas kev txhim kho: xyuas cov kev sib tw thiab cov teeb meem ntawm qhov chaw

Etching: tshem qhov siv lead ua dauv los ntawm kev qhib lub photoresist

Stripping: tshem tawm ntawm photoresist rau ntawm wafer

Kev ntsuam xyuas zaum kawg: qhov kev ntsuam xyuas ntawm qhov tsis zoo ntawm sab cev nqaij daim tawv thiab lwm yam teeb meem ntawm kev cuam tshuam


Nyob rau hauv qhov tseeb, photoresist yog tus tseem ceeb ntawm cov txheej txheem photolithography. Hauv kev tsim cov txheej txheem loj hauv kev loj hlob, lithography thiab etching technology yog cov txheej txheem tseem ceeb tshaj plaws hauv kev nplua kab nrauv, uas txiav txim siab tshaj qhov me me ntawm cov chips, uas yog nyiaj 40-50% ntawm lub ntim sijhawm, accounting rau 30 % ntawm cov raug nqi.


Kev daws teeb meem ntawm semiconductor manufacturing yog kev txhim kho, thiab qhov kev thov rau cov photoresist tseem muaj ntau thiab ntau dua. Cov khoom tsim kho tsim tawm los txhawb kev tsim cov khoom ntim tshuab chip.


Kev npaj, ci, raug, txhuam, thiab tshem tawm cov txheej txheem yuav raug nplua raws li cov khoom ntawm photoresist thiab qhov kev xav tau. Kev xaiv ntawm photoresist thiab kev tshawb nrhiav thiab kev loj hlob ntawm photoresist txheej txheem yog txheej txheem ntev thiab ntev. Photoresist yuav tsum tau phim nrog ntau txoj hauv kev lithography, daim npog ntsej muag thiab cov ntaub ntawv thaij hluav taws xob, vim li ntawd ib zaug ib txheej txheem lithography tsim, nws yuav tsis tshua hloov.


Kev tshawb nrhiav thiab kev loj hlob ntawm photoresist yog qhov nyuaj. Rau cov chaw tsim khoom ntawm semiconductor, nws yuav siv sij hawm ntev mus los hloov tus tsim photoresist. Nyob rau tib lub sij hawm, tus nqi ntawm photoluminescence kuj yog heev loj heev. Rau cov lag luam, kev sojntsuam ntau qhov yuavtsum tau muaj cov kabmob sib txuas. Tus nqi ntawm kev soj ntsuam yog lossis loj. Rau R & amp; D pawg, cov peev ntawm ib yam khoom photolithography yog ntau dua $ 10 lab, yog li cov lag luam me me yog ib qho nyuaj rau fim loj loj R & amp; D peev.


02 Cov ntsiab lus tseem ceeb thiab kev faib tawm ntawm photoresist

Zus tau cov photoresist tsis yog rau cov neeg xav tau kev pab xwb, tab sis kuj yog rau cov kev xav tau. Lawv yuav raug kho raws li lub wavelengths thiab cov kis tau ntawm ntau lub teeb. Nyob rau tib lub sij hawm kub photoresist muaj qee cov nta, siv ib txoj kev thiab kev teeb tsa, nrog rau qhov meej nto. Cov cwj pwm no yog txiav txim siab los ntawm hom, ntau npaum li cas thiab sib tov sib xyaw ntawm ntau yam tshuaj ntawm photoresist.


Photoresist yog tsim los ntawm 4 yam yooj yim, nrog rau tus neeg saib xyuas polymerization, hnyav, qib hnyav thiab ntxiv tshuaj.


Muaj pes tsawg leeg ntawm photoresist

Polymer: Thaum kis tau rau lithography, qauv polymer yog soluble thiab polymerized. Nws yog ib qhov xim tshwj xeeb thiab muaj zog tshwj xeeb polymer. Nws yog ua los ntawm ib pawg loj ntawm hnyav lwg me me. Cov qauv no muaj xws li carbon, hydrogen thiab oxygen. Yas yog ib hom polymer.


Qhov hnyav: Lub photoresist yog diluted rau daim ntawv nyias nyias, qhov loj tshaj plaws nyob rau hauv photoresist, kom photoresist nyob hauv lub xeev ua kua, thiab photoresist tau coated ntawm wafer ntog los ntawm txoj kev rov los ua ib txoj hauv txheej. Rau qhov tsis zoo ntawm cov kua nplaum yog xim kylene, siv rau roj hmab hnyav yog 2-ethhoxyethyl acetate los yog ob lub tshuaj methoxy acetaldehyde.


Tus neeg saib xyuas duab: Cov tshuaj tiv thaiv ntawm photoresist yog tswj thiab tswj tau thaum lub sij hawm kis raug.


Photosensitizer: Nws ntxiv rau photoresist kom tsis txhob muaj ntau yam spectral ntawm cov teeb meem reactive los txwv kom tsis txhob muaj qhov teeb meem tshwm sim rau ib qho kev tshav puam.


Additive: Qhov ntau ntawm cov khoom siv tshuaj ntxiv rau kev ua hauj lwm zoo, cov khoom siv ntxiv thiab sib tov ntawm ntau hom photoresist ua ke kom ua tiav cov txiaj ntsig, xws li cov kua nplaum tsis ntxiv nqus thiab tswj lub teeb, ntxiv cov tshuaj tiv thaiv cov kab mob hauv cov roj hmab.


Cov polymers nrog cov kua nplaum tsis zoo yuav tsum polymerized los ntawm lub xeev tsis polymerized tom qab kis. Qhov tseeb, cov polymers no tsim muaj cov khoom sib txuas ntawm cross-linked, uas yog ib qho khoom ua rau cov khoom phem. Yog li ntawd, nyob rau hauv qhuav ntawm glue tsis zoo, los tiv thaiv kom txhob muaj kev raug mob yog kwv yees nyob rau hauv lub zwj ceeb ntawm daj. Tsis zoo nkauj nplaum yog thawj photoresist, uas muaj qhov zoo adhesion, zoo thaiv cov nyhuv thiab cov duab ceev ceev. Txawm li ntawd los, nws yuav deform thiab nthuav thaum tsim, uas txwv kev daws teeb meem tsis zoo. Yog li ntawd, feem ntau, tsis siv cov kua nplaum tsuas yog siv nyob hauv thaj chaw dav dav hauv online.


Qhov roj hmab yooj yim polymer yog phenol formaldehyde polymer (Novolak resin). Hauv photoresist, polymer no kuj insoluble. Thaum raug rau lub zog tsim nyog, lub photoresist yuav tig mus rau hauv lub xeev. Cov tshuaj tiv thaiv no yog photolithographic cov tshuaj tiv thaiv. Tom qab ntawd lub neej tawg yuav raug muab tshem tawm hauv kev hnyav hauv kev txhim kho. Tej zaum yuav ntxiv cov tshuaj yaj yas ntxiv hauv kev siv photoresist, tiv thaiv cov khoom tsis muaj khib nyiab cov txheej txheem hauv kev txhim kho.


Feem ntau cov kev xav tau muaj cov yam ntxwv ntawm kev daws teeb meem, kev ua zoo rau cov kauj ruam, zoo ib yam; nyob rau tib lub sij hawm feem ntau muaj pluag adhesion, anti etching muaj peev xwm, muaj teeb meem loj.


Tsis pom zoo xws li cov kua nplaum uas tsis zoo ntawm lub nplhaib thiab cov kua nplaum ua kom tsis zoo (lub ntsiab tseem ceeb txawv txav lub ntsiab lus); qhov zoo xws li cov khoom zoo li lub cev (DNQ-Novolac system) thiab kev ua kom muaj zog photoresist (TSHEB).